PS2.8: Advances in Ion Microscopy
Session co-organisers: Beverley Inkson, Stefano Frabboni, Paul Alkemade
Ion beam microscopy is currently undergoing a rapid and exciting expansion of applications and new instrumentation. This symposium is aimed at Advances in Ion Microscopy, including focused Ga and He ion beams (FIB), secondary ion mass spectrometry (SIMS) and other novel ion sources. Contributions to the symposium are particularly solicited in the areas of novel techniques, 3D FIB tomography and chemical analysis, micromachining and specimen preparation, nanomanufacture, nanopatterning and FIB analysis of biomaterials. This session should be an excellent opportunity for discussing developments and networking within the ion microscopy community.
Thursday 20th September PM
14:00 Application of the Helium Ion Microscope to Biological Sciences and Nanopatterning
Daniel Pickard (Invited) National University of Singapore
14:30 Beyond Helium: The Future of Helium Ion Microscopy
Mohan Ananth (Contributed) Carl Zeiss NTS LLC, USA
14:45 Towards Secondary Ion Mass Spectrometry On The Helium Ion Microscope
D Dowsett (Contributed) Centre de Recherche - Gabriel Lippmann, Luxembourg
15:00 Modeling for multi-beam ion microscopy
D. Joy (Contributed) University of Tennessee, USA
15:15 Single-atom tip as an emitter of gas field ion sources
Ing-Shouh Hwang (Contributed) Institute of Physics, Academia Sinica, Taiwan
15:30 Is helium ion beam induced processing applicable to EUV mask repair?
Diederik Maas (Invited) TNO Delft, The Netherlands
10:00 Novel developments in FIBSEM add-on systems: in-situ TOF-SIMS, in-situ AFM, and gas injection
Ivo Utke (Invited) EMPA, Switzerland
10:30 Modification of the samples with helium ion microscope combined with local heating
Maria Rudneva (Contributed) National Centre for HREM, Delft University of Technology, The Netherlands
10:45 The impact of Ga from FIB micromachining on surface mechanical properties
A. Lockwood (Contributed) NanoLAB Centre, Department of Materials Science and Engineering, Sheffield, UK
11:00 Nanostructuring and in-situ characterization of cantilever resonators with a Dual Beam FIB-SEM system
G.C Gazzadi (Contributed) CNR Istituto di Nanoscienze-S3, Modena, Italy
11:15 Helium Ion Microscopy - Utilizing Channeling Contrast for Materials Investigation
D. C. Bell (Contributed) School of Engineering and Applied Science, Harvard University, USA
11:30 Focussed ion beam scanning electron microscopy in biology
Bruno Humbel (Invited) University of Lausanne, Switzerland
12:00 Novel plasma FIB/SEM for high speed failure analysis, 3D tomography and other applications
Tomáš Hrnčíř (Contributed) TESCAN, a.s. Brno, Czech Republic